| 1. Identity statement | ||||
| Reference Type | Journal Article | |||
| Site | mtc-m21b.sid.inpe.br | |||
| Holder Code | isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S | |||
| Identifier | 8JMKD3MGP3W34P/3NF282S | |||
| Repository | sid.inpe.br/mtc-m21b/2017/03.03.13.16 (restricted access) | |||
| Last Update | 2017:03.03.13.16.02 (UTC) administrator | |||
| Metadata Repository | sid.inpe.br/mtc-m21b/2017/03.03.13.16.02 | |||
| Metadata Last Update | 2018:06.04.02.27.20 (UTC) administrator | |||
| DOI | 10.1016/j.surfcoat.2016.08.067 | |||
| ISSN | 0257-8972 | |||
| Citation Key | UedaSMMROPR:2017:NePoPl | |||
| Title | New possibilities of plasma immersion ion implantation (PIII) and deposition (PIII&D) in industrial components using metal tube fixtures  | |||
| Year | 2017 | |||
| Month | Feb. | |||
| Access Date | 2024, May 19 | |||
| Type of Work | journal article | |||
| Secondary Type | PRE PI | |||
| Number of Files | 1 | |||
| Size | 3306 KiB | |||
| 2. Context | ||||
| Author | 1 Ueda, Mário 2 Silva Junior, Ataide Ribeiro da 3 Mitma Pillaca, Elver Juan de Dios 4 Mariano, Samantha de Fátima Magalhães 5 Rossi, José Osvaldo 6 Oliveira, Rogério de Moraes 7 Pichon, L. 8 Reuther, H. | |||
| Resume Identifier | 1 8JMKD3MGP5W/3C9JHSB 2 3 4 5 8JMKD3MGP5W/3C9JHJ5 6 8JMKD3MGP5W/3C9JJ6L | |||
| Group | 1 LABAP-COCTE-INPE-MCTIC-GOV-BR 2 LABAP-COCTE-INPE-MCTIC-GOV-BR 3 LABAP-COCTE-INPE-MCTIC-GOV-BR 4 CMS-ETES-SESPG-INPE-MCTIC-GOV-BR 5 LABAP-COCTE-INPE-MCTIC-GOV-BR 6 LABAP-COCTE-INPE-MCTIC-GOV-BR | |||
| Affiliation | 1 Instituto Nacional de Pesquisas Espaciais (INPE) 2 Instituto Nacional de Pesquisas Espaciais (INPE) 3 Instituto Nacional de Pesquisas Espaciais (INPE) 4 Instituto Nacional de Pesquisas Espaciais (INPE) 5 Instituto Nacional de Pesquisas Espaciais (INPE) 6 Instituto Nacional de Pesquisas Espaciais (INPE) 7 CNRS-Université de Poitiers-ENSMA 8 Helmholtz-Zentrum Dresden-Rossendorf | |||
| Author e-Mail Address | 1 mario.ueda@inpe.br 2 ataide@plasma.inpe.br 3 elver.mitma@inpe.br 4 samanthafmm@outlook.com 5 jose.rossi@inpe.br 6 rogerio.oliveira@inpe.br | |||
| Journal | Surface and Coatings Technology | |||
| Volume | 312 | |||
| Pages | 37-46 | |||
| Secondary Mark | A1_MATERIAIS A1_ENGENHARIAS_II A2_SAÚDE_COLETIVA A2_INTERDISCIPLINAR A2_GEOCIÊNCIAS A2_ENGENHARIAS_III B1_ODONTOLOGIA B1_MEDICINA_II B1_ENGENHARIAS_IV B1_ASTRONOMIA_/_FÍSICA B2_QUÍMICA B2_CIÊNCIAS_BIOLÓGICAS_I | |||
| History (UTC) | 2017-03-03 13:16:02 :: simone -> administrator :: 2017-03-03 13:16:02 :: administrator -> simone :: 2016 2017-03-03 13:17:08 :: simone -> administrator :: 2016 -> 2017 2017-07-03 13:04:00 :: administrator -> simone :: 2017 2017-12-15 14:22:58 :: simone -> administrator :: 2017 2018-06-04 02:27:20 :: administrator -> simone :: 2017 | |||
| 3. Content and structure | ||||
| Is the master or a copy? | is the master | |||
| Content Stage | completed | |||
| Transferable | 1 | |||
| Content Type | External Contribution | |||
| Version Type | publisher | |||
| Keywords | Batch processing Hollow cathode plasma Industrial components Metal tube fixture Plasma immersion ion implantation Plasma immersion ion implantation and deposition | |||
| Abstract | New possibilities of Plasma Immersion Ion Implantation (PIII) and deposition (PIII&D) for treating industrial components in the batch mode have been explored. A metal tubular fixture is used to allocate the components inside around and along the tube, exposing to the plasma only the parts of each component that will be implanted. Hollow cathode- like plasma is generated only inside the tube filled with the desired gas, by applying high negative voltage pulses to the hollow cylindrical metal fixture which is insulated from the vacuum chamber walls. The metal tube (Me-tube) loaded with workpieces can be set-up inside the vacuum chamber in the standing-up, upside down or lying down arrangements. PIII tests were also run with and without metal sheet lids on the tube as well as with and without the components. Sputtering deposition and carbonitriding are also possible in this scheme by placing carbon tapes inside the tube and running the process with nitrogen PIII. Relatively clean DLC (Diamond Like Carbon) PIII&D deposition is possible by this method also since the plasma occupies mainly the Me-tube interior and not the whole chamber. Furthermore, operating high density PIII and PIII&D systems without additional plasma source, using only the high voltage pulser, is now possible to treat three dimensional parts. These methods are very convenient for batch processing of industrial parts by ion implantation and by ion implantation and deposition, in which a large number of small to medium size components can be treated by PIII and PIII&D, very quickly, efficiently and also at low cost. | |||
| Area | FISPLASMA | |||
| Arrangement 1 | urlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAP > New possibilities of... | |||
| Arrangement 2 | urlib.net > BDMCI > Fonds > Produção pgr ATUAIS > CMS > New possibilities of... | |||
| doc Directory Content | access | |||
| source Directory Content | there are no files | |||
| agreement Directory Content |
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| 4. Conditions of access and use | ||||
| Language | en | |||
| Target File | ueda_new.pdf | |||
| User Group | simone | |||
| Reader Group | administrator simone | |||
| Visibility | shown | |||
| Archiving Policy | denypublisher denyfinaldraft24 | |||
| Read Permission | deny from all and allow from 150.163 | |||
| Update Permission | not transferred | |||
| 5. Allied materials | ||||
| Linking | 8JMKD3MGP3W34P/3PE5922 | |||
| Mirror Repository | sid.inpe.br/mtc-m21b/2013/09.26.14.25.22 | |||
| Next Higher Units | 8JMKD3MGPCW/3ET2RFS 8JMKD3MGPCW/3F358GL | |||
| Citing Item List | sid.inpe.br/bibdigital/2013/09.25.21.49 2 sid.inpe.br/mtc-m21/2012/07.13.14.59.24 2 sid.inpe.br/mtc-m21/2012/07.13.14.52.24 1 | |||
| Dissemination | WEBSCI; PORTALCAPES; COMPENDEX. | |||
| Host Collection | sid.inpe.br/mtc-m21b/2013/09.26.14.25.20 | |||
| 6. Notes | ||||
| Empty Fields | alternatejournal archivist callnumber copyholder copyright creatorhistory descriptionlevel e-mailaddress format isbn label lineage mark nextedition notes number orcid parameterlist parentrepositories previousedition previouslowerunit progress project rightsholder schedulinginformation secondarydate secondarykey session shorttitle sponsor subject tertiarytype url | |||
| 7. Description control | ||||
| e-Mail (login) | simone | |||
| update | ||||